Ultra-High Vacuum Multi-Chamber Cluster Tool (UHVCVD)

The CVD Deposition Process Chamber Vacuum System is designed for operation of the CVD Deposition Process Chamber at 1 to 500 Torr and is capable of pumping a process Chamber to a level of <5X10E-8 Torr and can operate at temperatures up to 1000 degrees Celsius.

Please contact us for further details on our equipment or lab use.