Metalorganic CVD System
(MOCVD/MOVPE)

CVD Equipment’s MOCVD Chemical Vapor Deposition System is an advanced research Reactor for the deposition of complex semiconductor and superconducting layers. The system has the capability of producing a wide range of material specifications in a reproducible fashion. CVD is a major supplier of MOCVD equipment to industry. We supply production and research equipment for multiple research and industrial applications.

Some MOCVD/MOVPE system features include:

• Wafer size as specified
• Stainless Steel or Quartz Chamber
• IR or RF heating
• Shower Head Gas Injection
• Wafer Rotation
• Deposited materials
  • III-V (GaN, GaAs, AlGaN, InP, etc)
  • II-VI (ZnO, ZnS)
  • IV (Si, Ge, Strained Si)
  • Proprietary films

Please visit our First Nano website for more details on the EasyTube™ 5000 MOCVD System.