Metalorganic CVD System
(MOCVD/MOVPE)

CVD Equipment offers Metalorganic CVD systems for compound semiconductor material deposition.

MOCVD/MOVPE system features include:

• Wafer size: 2" to 3"
• Number of wafer: up to 10
• Stainless Steel or Quartz Chamber
• IR or RF heating
• Shower Head Gas Injection
• Wafer Rotation
• Deposited materials
  • III-V (GaN, GaAs, AlGaN, InP, etc)
  • II-VI (ZnO, ZnS)
  • IV (Si, Ge, Strained Si)