Hydrogen Chloride (HCl) Etching System

CVD Equipment's Hydrogen Chloride (HCl) Etching System is an automatically controlled production unit for Hydrogen Chloride Etching or Vacuum Baking of susceptors to pre-condition and remove III-V deposits. The system is capable of operating at temperatures up to 1200 °C with Hydrogen and Hydrogen Chloride. The system is used to support LED manufacturing in cleaning graphite susceptors and quartz that is used in MOCVD and VPE systems.

Hydrogen Chloride (HCl) Etching System Features Include:

• HCL Etcher is made to clean III-V deposits on
  graphite susceptors with Dry Etching using HCL gas at high temperature instead of Wet Etching using acid. Dry etching is faster and cleaner than wet etching in cleaning susceptors and eliminates the baking process after cleaning. It will also pre-condition new susceptors and increase productivity and yield by eliminating the contaminating residues that can be left by wet etching.
• With the dry etching process, the performance of susceptor stays the same by avoiding any liquid and moisture residue. It allows repeatable results on film deposition from run-to-run.
• The susceptor is ready to use after dry etching. No residue remains on the susceptor and contamination is avoided.
• The dry etching process eliminates the acid etching and baking process so that the life of the susceptor is longer.
• The HCL etcher supports MOCVD and VPE reactors that are used in LED manufacturing. One HCL etcher can support five (5) or more MOCVD/VPE reactors.
• With the HCL etcher, susceptors can be cleaned in house which reduces the overall manufacturing cost.