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Silicon Carbides

Silicon Carbide (SiC) has been used in abrasive, structure materials, surface coating, high temperature applications, and semiconductor due to its superior properties.

At CVD we provide high purity SiC systems for deposition. Our process is done at a temperature higher than 1500 °C using RF induction heating, SiH4. Hydrocarbon gases are used as well as precursors.

Click for larger view silicon carbide growth system
cantilievered loading and unloading of bulk silicon carbide growth system
silicon carbide growth system
cantilievered loading and unloading of bulk silicon carbide growth system
single Single Wafer Quartz Chamber

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