Semiconductor/MEMS

Thin Film materials are the foundation of Semiconductor and MEMS technologies and CVD is the most common method used for thin film deposition. These thin film materials have various forms including mono-crystalline, poly-crystalline, amorphous, and epitaxial. The materials include Si, Ge, SiGe, Silicon Nitride, Silicon Oxide, Silicon Carbide, other oxides and nitrides, metals and many more.