Annealing/Sintering

Annealing/sintering is required in many processes after deposition. It can be done at atmospheric pressure or low pressure inside O2, H2, inert gases or vacuum.

CVD Equipment offers single chamber and multi-chamber systems with a resistance furnace for regular annealing and sintering, or an infrared furnace for Rapid Thermal Annealing (RTA).

Please contact us for further details.